Ultra-high Resolution Electron-beam Lithography System
ETH Zürich - Abt. Procurement & Export Services
En bref
- Canton / pays
- Rüschlikon · Zurich
- Type de marché
- Fournitures
- Projet
- 45007
- Mandant
- ETH Zürich - Abt. Procurement & Export Services
- Publié
- 1 oct. 2026
- Offres jusqu’au
- 10 nov. 2026, 23:58
Description
The B & R Nanotechnology Center (BRNC) at ETH Zurich invites tenders for the purchase of one (1) ultra-high resolution electron-beam lithography (EBL) system. The system will be used for a variety of research activities of internal and external users, ranging from the generation of high-precision structures at the nanometer level to the rapid exposure of complex structures over large areas. The scope includes delivery, installation, training and acceptance of the system.
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